The low pressure chemical vapor deposition of germanium by the thermal decomposition of germane on <100> silicon

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https://hdl.handle.net/2142/93710

Title: The low pressure chemical vapor deposition of germanium by the thermal decomposition of germane on <100> silicon
Author(s): Coronell, Daniel G.
Issue Date: 1988
Discipline: Chemical Engineering
Degree Name: B.S. (bachelor's)
Degree Level: Thesis
Keyword(s): Chemical engineering
Language: eng
Type of Resource: text
Permalink: http://hdl.handle.net/2142/93710