Stress and Orientation Effects in Ferroelectric Thin Films
Lian, Lei
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https://hdl.handle.net/2142/87696
Description
Title
Stress and Orientation Effects in Ferroelectric Thin Films
Author(s)
Lian, Lei
Issue Date
2001
Doctoral Committee Chair(s)
Sottos, Nancy R.
Department of Study
Theoretical and Applied Mechanics
Discipline
Theoretical and Applied Mechanics
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
The effects of stress on the response of ferroelectric thin films are measured directly by a beam bending experiment in a unique double-beam laser interferometer. Application of a compressive bending stress to relieve the tensile residual stress in PZT (52/48) film increases the field-induced strains. The opposite effect is observed for application of a tensile stress. To gain further insight into these observations, a previously developed micro-electro-mechanical model is applied to numerically simulate the response of ferroelectrics under a general state of stress and electric field. Material parameters obtained by fitting simulation results with available experimental data are used to predict effects of the preferred crystallographic orientation and biaxial tensile stress applied transverse to the poling direction. The simulation results are consistent with experimental observations of the preferred orientation and stress effects in PZT (52/48) thin films.
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