Multi-Scale Transport Phenomena in Low-Pressure Plasmas
Grapperhaus, Michael James
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https://hdl.handle.net/2142/85937
Description
Title
Multi-Scale Transport Phenomena in Low-Pressure Plasmas
Author(s)
Grapperhaus, Michael James
Issue Date
1998
Doctoral Committee Chair(s)
Kushner, Mark J.
Department of Study
Nuclear Engineering
Discipline
Nuclear Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Electronics and Electrical
Language
eng
Abstract
To account for the surface effects on the plasma behavior, a mesoscale Monte Carlo simulation has been developed which joins the die-scale surface chemistry with the plasma scale in the HPEM. The presence of etch products in the plasma is seen to perturb the bulk plasma. The presence of photoresist redeposition is seen to have a minor, but important, effect on the etch rate. At low pressure, the etch rate is increased, although the probability of a given ion causing an etch is decreased.
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