This item is only available for download by members of the University of Illinois community. Students, faculty, and staff at the U of I may log in with your NetID and password to view the item. If you are trying to access an Illinois-restricted dissertation or thesis, you can request a copy through your library's Inter-Library Loan office or purchase a copy directly from ProQuest.
Permalink
https://hdl.handle.net/2142/84480
Description
Title
Soft Lithographic Patterning on Silicon
Author(s)
Finnie, Krista Renee
Issue Date
2000
Doctoral Committee Chair(s)
Nuzzo, Ralph G.
Department of Study
Chemistry
Discipline
Chemistry
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Chemistry, Inorganic
Language
eng
Abstract
A methodology for controlling the nanoscale architecture of etched silicon was developed though the printing of mixed monolayers. Contact printing of mixed solutions of different mole fractions of DTS and octyltrichlorosilane (OCTY) were formed monolayers on Si. Once annealed in air, these films were placed into KOH etching solutions and the resulting grain structures were examined via AFM. The data showed that different mole fractions created different grain structures after exposure to the etching solution. Additionally, the resulting etch structures were tested for photoluminescence, though only weak PL was found.
Use this login method if you
don't
have an
@illinois.edu
email address.
(Oops, I do have one)
IDEALS migrated to a new platform on June 23, 2022. If you created
your account prior to this date, you will have to reset your password
using the forgot-password link below.
