Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces
Crane, Elizabeth Larson
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https://hdl.handle.net/2142/84478
Description
Title
Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces
Author(s)
Crane, Elizabeth Larson
Issue Date
2000
Doctoral Committee Chair(s)
Nuzzo, Ralph G.
Department of Study
Chemistry
Discipline
Chemistry
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Chemistry, Inorganic
Language
eng
Abstract
Metal deposition from hexafluoroacetylacetonate complexes is also examined on Cu(111) and Pt(100) surfaces single crystal surfaces. In the case of the Rh(hfac)(C2H4)2 and Pt(hfac)2 on a copper surface, the transfer of the hfac ligands takes place below ∼220 K and this species subsequently either decomposes or reacts with the substrate to form Cu(hfac)2. This latter reaction is promoted by the presence of platinum on the copper surface but not by the presence of rhodium. In the reaction of Pt(hfac)2 on Pt(100), ligand dissociation begins ∼400 K and the resultant CFx surface fragments recombine to form a fluorocarbon species. This pathway is more strongly promoted in the presence of hydrogen as a reducing agent.
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