Part I. Synthesis of Metal Hydroborates as Potential Chemical Vapor Deposition Precursors. Part II. Chemical Vapor Deposition of Titanium-Doped Magnesium Diboride Thin Films
Kim, Do Young
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https://hdl.handle.net/2142/84260
Description
Title
Part I. Synthesis of Metal Hydroborates as Potential Chemical Vapor Deposition Precursors. Part II. Chemical Vapor Deposition of Titanium-Doped Magnesium Diboride Thin Films
Author(s)
Kim, Do Young
Issue Date
2007
Doctoral Committee Chair(s)
Girolami, Gregory S.
Department of Study
Chemistry
Discipline
Chemistry
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
The first low-temperature chemical vapor depositions of doped MgB 2 phases have been achieved by passing the precursor Mg(H3BNMe 2BH3)2 over a surface in the presence of a catalyst that accelerates the rate of the CVD growth reaction. Transition metal hydroborates can serve as effective catalysts, of which Ti(H3BNMe2BH 3)2 is the most attractive so far because it leads to the lowest level of Mg site substitution; the resulting film stoichiometry is Mg0.8Ti0.2B2. Although the metal substitution renders the films non-superconducting above 4 K, the results clearly point the way to the development of technologically-attractive CVD processes to grow superconducting MgB2 thin films at temperatures below 400°C.
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