Amplification of Soft Lithographic Patterning of Silicon
Harada, Yoshiko
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https://hdl.handle.net/2142/84062
Description
Title
Amplification of Soft Lithographic Patterning of Silicon
Author(s)
Harada, Yoshiko
Issue Date
2002
Doctoral Committee Chair(s)
Girolami, Gregory S.
Nuzzo, Ralph G.
Department of Study
Chemistry
Discipline
Chemistry
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
Two examples of Si patterning via microcontact printing (muCP) are given in this thesis. In both cases, Si substrates were patterned with OTS by MCP to protect the underlying substrate. The first example shows the use of an OTS template in orthogonal printing of OCT to activate OTS-free areas, followed by surface-initiated ring-opening metathesis polymerization (ROMP) of strained olefins to amplify the original pattern inscribed by muCP In the second example, an OTS template was used to selectively deposit a Pt(O) complex, which was used in Pt-assisted etching of Si(100) to produce porous silicon structures in the Pt-coated regions.
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