Transition Metal Hydroborate Complexes: Structures, Syntheses, and Use as Chemical Vapor Deposition Precursors
Goedde, Dean Matthew
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https://hdl.handle.net/2142/84023
Description
Title
Transition Metal Hydroborate Complexes: Structures, Syntheses, and Use as Chemical Vapor Deposition Precursors
Author(s)
Goedde, Dean Matthew
Issue Date
2001
Doctoral Committee Chair(s)
Girolami, Gregory S.
Department of Study
Chemistry
Discipline
Chemistry
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Chemistry, Inorganic
Language
eng
Abstract
Passage of Zr(BH4)4 over heated substrates with a coincident flux of H atoms gives adhesive, mirror-bright films at a growth rate of 60 A/min. These films are smooth on the nanometer scale and possess electrical resistivities as low as 45 muO-cm. The films are free of carbon and have low concentrations of oxygen (∼4 at. %). Deposition at 150°C achieves films of formula ZrB1.8O 0.1. In contrast, films grown under purely thermal conditions or by other plasma-assisted methods have boron-to-metal ratios near 3:1 and oxidize readily in air.
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