Study of Buoyancy -Induced Flows in a Prototypical CVD Reactor
Luo, Gang
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https://hdl.handle.net/2142/83802
Description
Title
Study of Buoyancy -Induced Flows in a Prototypical CVD Reactor
Author(s)
Luo, Gang
Issue Date
2003
Doctoral Committee Chair(s)
S. Pratap Vanka
Department of Study
Mechanical Engineering
Discipline
Mechanical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Mechanical
Language
eng
Abstract
Next, an understanding the influence of the transient operating conditions in the prototypical CVD reactor was sought. Film growth rate shows time varying pattern due to the transient operating conditions. But it oscillates between two end steady states. Thus, it is observed that film growth rate and uniformity cannot be improved by applying pulse sequence of precursor gas, pulse sequence of inlet mass flow rate, and time-varying rotation speed of the wafer.
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