Electrical Properties of Nitride/oxide Multilayered Thin Films
Chung, Hyunim
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https://hdl.handle.net/2142/82939
Description
Title
Electrical Properties of Nitride/oxide Multilayered Thin Films
Author(s)
Chung, Hyunim
Issue Date
2001
Doctoral Committee Chair(s)
Mark Shannon
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Chemical
Language
eng
Abstract
SASAS film did not have a smoother surface compared to SiNx films. Therefore, surface roughness was not a factor for the increased dielectric strength of the multilayered films. There were no observed dielectric strength increase for the nitride/nitride, oxide/oxide multilayered films.
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