Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
Karr, Brian William
This item is only available for download by members of the University of Illinois community. Students, faculty, and staff at the U of I may log in with your NetID and password to view the item. If you are trying to access an Illinois-restricted dissertation or thesis, you can request a copy through your library's Inter-Library Loan office or purchase a copy directly from ProQuest.
Permalink
https://hdl.handle.net/2142/82887
Description
Title
Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
Author(s)
Karr, Brian William
Issue Date
1997
Doctoral Committee Chair(s)
Cahill, David G.
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
The group IV-B transition metal nitride TiN is widely employed as a wear-resistant coating on mechanical components and as a diffusion barrier in microelectronic devices. I use the epitaxial growth of single crystal TiN as a model system for insight on the evolution of surface morphology and microstructure in more complex polycrystalline films. Atomically-flat MgO substrates, prepared by air annealing at 950$\sp\circ$C for 12 hours, are verified by atomic force microscopy (AFM). Epitaxial TiN layers are grown on MgO(001) by reactive magnetron sputter deposition in pure N$\sb2$ at $\rm65048$ V leads to enhanced surface roughening with decreased in-plane length scales resulting from bulk defect production.
Use this login method if you
don't
have an
@illinois.edu
email address.
(Oops, I do have one)
IDEALS migrated to a new platform on June 23, 2022. If you created
your account prior to this date, you will have to reset your password
using the forgot-password link below.
