Evaporative Lithographic Patterning of Colloidal Films
Harris, Daniel James
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https://hdl.handle.net/2142/82818
Description
Title
Evaporative Lithographic Patterning of Colloidal Films
Author(s)
Harris, Daniel James
Issue Date
2008
Doctoral Committee Chair(s)
Lewis, Jennifer A.
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
Finally, fluid flow and pattern formation during evaporative lithographic patterning of non-aqueous colloidal films differ significantly from their aqueous counterparts. Evaporative cooling creates surface tension gradients that induce recirculating flows and a majority of the particles are deposited at the interface between recirculating flow cells in the non-evaporating, masked regions. Above a critical colloid volume fraction, recirculating flows are suppressed, and a majority of the particles are convected to the regions of higher evaporative flux.
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