Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors
Jayaraman, Sreenivas
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https://hdl.handle.net/2142/82770
Description
Title
Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors
Author(s)
Jayaraman, Sreenivas
Issue Date
2005
Doctoral Committee Chair(s)
Abelson, John R.
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Chemistry, Inorganic
Language
eng
Abstract
Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.
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