Stress Induced Deformations of Thin Silicon Dioxide Films
Serrano, Justin Raymond
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https://hdl.handle.net/2142/82758
Description
Title
Stress Induced Deformations of Thin Silicon Dioxide Films
Author(s)
Serrano, Justin Raymond
Issue Date
2004
Doctoral Committee Chair(s)
Cahill, David G.
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
The behavior of compressive silicon dioxide films deposited by magnetron sputtering, on PMMA, a low Tg polymer, were also studied. SiO2 films exhibited a linear increase in the surface roughness for deposited thickness below ∼10 nm; larger thickness showed an almost unchanged roughness. Since stresses generated in thin films during sputtering are independent of surface morphology, the roughening of the films is treated as a stress-driven roughening mechanism, where the compressive stress in the films causes buckling of the films during growth.
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