Low-Temperature Silicon Thin Films for Large-Area Electronics: Device Fabrication Using Soft Lithography and Laser-Crystallization by Sequential Lateral Solidification
Jin, Hyun-Chul
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https://hdl.handle.net/2142/82710
Description
Title
Low-Temperature Silicon Thin Films for Large-Area Electronics: Device Fabrication Using Soft Lithography and Laser-Crystallization by Sequential Lateral Solidification
Author(s)
Jin, Hyun-Chul
Issue Date
2001
Doctoral Committee Chair(s)
Abelson, John Robert
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
We have analyzed the electrical properties of SLS poly-Si films on oxidized Si wafer using the pseudo-MOSFET geometry; the majority carrier mobility is extracted from the transconductance. However, the data are non-ideal due to large contact resistance and current spreading. We discuss the future use of these electrical characterization techniques to analyze the properties of individual grain boundaries in thin film Si bicrystals formed by SLS.
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