Preparations and Characterizations of Tantalum Pentoxide-Titanium Dioxide: Ceramics and Thin Films
Hemjinda, Sarunya
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https://hdl.handle.net/2142/82709
Description
Title
Preparations and Characterizations of Tantalum Pentoxide-Titanium Dioxide: Ceramics and Thin Films
Author(s)
Hemjinda, Sarunya
Issue Date
2001
Doctoral Committee Chair(s)
Payne, David A.
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
A chemical-solution deposition method was used to integrate thin films of Ta2O5-TiO2 onto silicon substrates. Precursor solutions were successfully prepared using Ta(OEt)5 and Ti(OEt) 4 in ethanol. Solution stability was shown to be influenced by several factors, including, Rw ratio, additions of HCl, and, most importantly, conditions of hydrolysis. Electrical measurements revealed that amorphous films exhibited the most favorable dielectric properties, with low tandelta = 0.005 and K' = 27.
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