Control of Thin-Film Silicon Microstructure With Low-Energy Particle Bombardment in Reactive Sputtering
Gerbi, Jennifer Elizabeth
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https://hdl.handle.net/2142/82698
Description
Title
Control of Thin-Film Silicon Microstructure With Low-Energy Particle Bombardment in Reactive Sputtering
Author(s)
Gerbi, Jennifer Elizabeth
Issue Date
2001
Doctoral Committee Chair(s)
Abelson, John Robert
Department of Study
Materials Science and Engineering
Discipline
Materials Science and Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Physics, Condensed Matter
Language
eng
Abstract
Hydrogen can be added to the growth chamber to promote a phase change to nanocrystalline silicon at moderate growth temperatures. The growth flux with hydrogen includes energetic (∼100eV) neutral H, produced by the reflection of H2+ions from the target. We determine the kinetic role of these fast H neutrals in the nanocrystalline phase formation by substituting D for H during growth. Crystallization is enhanced with D; we suggest that this higher mass specie enhances a sub-surface restructuring process by enhanced momentum transfer to silicon atoms.
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