Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films
Stephens, Ryan Mark
This item is only available for download by members of the University of Illinois community. Students, faculty, and staff at the U of I may log in with your NetID and password to view the item. If you are trying to access an Illinois-restricted dissertation or thesis, you can request a copy through your library's Inter-Library Loan office or purchase a copy directly from ProQuest.
Permalink
https://hdl.handle.net/2142/82412
Description
Title
Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films
Author(s)
Stephens, Ryan Mark
Issue Date
2008
Doctoral Committee Chair(s)
Alkire, Richard C.
Department of Study
Chemical Engineering
Discipline
Chemical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Language
eng
Abstract
A two-step approach was used to calculate the spatial distribution of nucleation events on an electrode undergoing deposition by electrolysis under the influence of mass transport. The simulations were carried out by first, calculating the time-dependent concentration profiles in the vicinity of a hemispherical nucleus, then using the concentration profiles as boundary conditions for a surface simulation that relied on the island dynamics algorithm. The model additive system was found to uniformize the distribution of nuclei on the simulated surface, leading to a significant reduction in the size of nucleation exclusion zones.
Use this login method if you
don't
have an
@illinois.edu
email address.
(Oops, I do have one)
IDEALS migrated to a new platform on June 23, 2022. If you created
your account prior to this date, you will have to reset your password
using the forgot-password link below.
