Dynamics of High- and Low -Pressure Plasma Remediation
Xu, Xudong
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Permalink
https://hdl.handle.net/2142/81327
Description
Title
Dynamics of High- and Low -Pressure Plasma Remediation
Author(s)
Xu, Xudong
Issue Date
1999
Doctoral Committee Chair(s)
Kushner, Mark J.
Department of Study
Electrical Engineering
Discipline
Electrical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Environmental Sciences
Language
eng
Abstract
The use of DBDs as excimer ultraviolet (UV) lighting sources was also studied. The mixture Xe/Cl2 ≈ 99/1 was found to be an optimum gas mixture for the generation of the XeCl*. Higher applied voltage improves both the intensity and efficiency of UV photon generations. The strong attachment at high Cl2 concentration (e.g., ≥5%) leads to electron shell propagation to smaller radii after the voltage pulse.
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