Microelectromechanical and Microfluidic Systems for Scanning Probe Lithography
Wang, Xuefeng
This item is only available for download by members of the University of Illinois community. Students, faculty, and staff at the U of I may log in with your NetID and password to view the item. If you are trying to access an Illinois-restricted dissertation or thesis, you can request a copy through your library's Inter-Library Loan office or purchase a copy directly from ProQuest.
Permalink
https://hdl.handle.net/2142/80938
Description
Title
Microelectromechanical and Microfluidic Systems for Scanning Probe Lithography
Author(s)
Wang, Xuefeng
Issue Date
2005
Doctoral Committee Chair(s)
Chang Liu
Department of Study
Electrical Engineering
Discipline
Electrical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Electronics and Electrical
Language
eng
Abstract
This work addresses two major challenges faced by traditional single-probe SPL technology---lithography throughput and probe coating technique. System-level improvements of SPL have been successfully achieved. First, micromachined, thermally actuated cantilever probe arrays are developed to improve the throughput and flexibility of SPL. Multiple distinct patterns have been generated simultaneously with sub-50-nm line width in dip pen nanolithography (DPN) mode. Then, development of scanning probe contact printing (SPCP) technology and multifunctional probe arrays has expanded the capability of conventional single-functional SPL and demonstrated an excellent example of a highly integrated scanning probe device for pattern generation in DPN and SPCP modes and pattern inspection in AFM and LFM modes. In addition, the development of integrated microfluidic inking chips for chemical ink handling and SPL probe treatment further enhances the power of arrayed scanning probes. The inking chip can potentially coat an array of SPL tips with different inks simultaneously for multi-ink lithography.
Use this login method if you
don't
have an
@illinois.edu
email address.
(Oops, I do have one)
IDEALS migrated to a new platform on June 23, 2022. If you created
your account prior to this date, you will have to reset your password
using the forgot-password link below.
