Aluminum Gallium Arsenide-Gallium Arsenide-Indium Gallium Arsenide-Indium Arsenide Quantum Dot Coupled to Quantum Well Heterostructure Lasers by Low-Pressure Metalorganic Chemical Vapor Deposition
Chung, Theodore
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Permalink
https://hdl.handle.net/2142/80831
Description
Title
Aluminum Gallium Arsenide-Gallium Arsenide-Indium Gallium Arsenide-Indium Arsenide Quantum Dot Coupled to Quantum Well Heterostructure Lasers by Low-Pressure Metalorganic Chemical Vapor Deposition
Author(s)
Chung, Theodore
Issue Date
2003
Doctoral Committee Chair(s)
Holonyak, Nick, Jr.
Department of Study
Electrical Engineering
Discipline
Electrical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Physics, Condensed Matter
Language
eng
Abstract
Data are presented showing that, besides the improvement in carrier collection, it is advantageous to locate strain-matching auxiliary InGaAs layers [quantum wells (QWs)] within tunneling distance of a single-quantum-dot (QD) layer of an AlGaAs-GaAs-InGaAs-InAs QD heterostructure laser to realize also smaller size QDs of greater density and uniformity. The QD density is changed from 2 x 1010/cm2 for a 50-A GaAs coupling barrier (QW to QD) to 3 x 1010/cm2 for a 5-A barrier. The improved QD density and uniformity, as well as improved carrier collection, make possible room-temperature continuous-wave (cw) QD + QW laser operation (a single InAs QD layer) at reasonable diode length (∼1 mm), current density 586 A/cm2, and wavelength 1057 nm. QW-assisted single-layer InAs QD laser, a QD + QW laser, is demonstrated that operates cw (300 K), and at diode length 150 mum in pulsed operation exhibits gain as high as ∼100 cm-1. The cw 300-K coupled InAs QD and InGaAs QW AlGaAs-GaAs-InGaA-InAs heterostructure lasers are grown by metalorganic chemical vapor deposition.
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