Modeling and Measurements of an Ionized Physical Vapor Depositon Device Plasma
Juliano, Daniel Rene
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https://hdl.handle.net/2142/80677
Description
Title
Modeling and Measurements of an Ionized Physical Vapor Depositon Device Plasma
Author(s)
Juliano, Daniel Rene
Issue Date
2000
Doctoral Committee Chair(s)
Ruzic, David N.
Department of Study
Physics
Discipline
Physics
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Electronics and Electrical
Language
eng
Abstract
Third, a computer simulation was used to model the transport of sputtered atoms through the IPVD system. The simulation combines Monte Carlo and fluid methods to track the metal atoms that are emitted from the target, interact with the IPVD plasma, and are eventually deposited somewhere in the system. Ground-state neutral, excited, and ionized metal atoms are tracked. The simulation requires plasma conditions to be specified. The primary product of the simulation is a prediction of the ionization fraction of the sputtered atom flux at the substrate under various conditions. This quantity was experimentally measured and the results compared to the simulation.
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