Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device
Dai, Zhen
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https://hdl.handle.net/2142/78544
Description
Title
Hydrogen gas generation by water vapor dissociation in an Al/Al2O3 microchannel plasma device
Author(s)
Dai, Zhen
Issue Date
2015-04-30
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
Plasma
Hydrogen
Water Dissociation
optical emission spectra (OES)
Abstract
An aluminum/alumina (Al/Al2O3) microchannel plasma reactor is used to generate H2 with an energy efficiency of 2.5 % by dissociating water vapor in Ar at atmospheric pressure and room temperature. The value compares favorably to other plasma reactors reported in the literature, having reported energy efficiencies ≤ 2 %. Additionally, spectra of the Hα line are used to calculate electron densities, which are in the vicinity of 1.5 ± 0.2 × 1016 cm-3, while spectra of the OH(A-X) transition show a distinctly non-equilibrium population distribution in the OH(A2Σ+) state. Al/Al2O3 microchannel plasma device was shown to be efficient in water dissociation as compared with other plasma reactors recently reported in the literature.
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