University of Illinois Urbana-Champaign

Submillimeter Spectroscopic Diagnostics In Semiconductor Processing Plasmas

Helal, Yaser H.

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https://hdl.handle.net/2142/50786

Description

Title
Submillimeter Spectroscopic Diagnostics In Semiconductor Processing Plasmas
Author(s)
Helal, Yaser H.
Contributor(s)
  • Armacost, Michael D.
  • Walker, Quentin
  • Stout, Phillip J.
  • Ewing, Paul R.
  • De Lucia, Frank C.
  • Neese, Christopher F.
Issue Date
2014-06-17
Keyword(s)
Instrument/Technique Demonstration
Abstract
Submillimeter absorption spectroscopy was used to study semiconductor processing plasmas. Abundances and temperatures of molecules, radicals, and ions can be determined without altering any of the properties of the plasma. The behavior of these measurements provides useful applications in monitoring process steps. A summary of such applications will be presented, including etching and cleaning endpoint detection.
Publisher
International Symposium on Molecular Spectroscopy
Type of Resource
text
Language
English
Permalink
http://hdl.handle.net/2142/50786
DOI
https://doi.org/10.15278/isms.2014.TB07
Copyright and License Information
Copyright 2014 by the authors. Licensed under a Creative Commons Attribution 4.0 International License. http://creativecommons.org/licenses/by/4.0/

Owning Collections

Abstracts & Presentations - 2014 International Symposium on Molecular Spectroscopy PRIMARY