Characterization of Etching Process and Etch Rate of Aluminum Thin Film

Kang, "Ryan" Sungho

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https://hdl.handle.net/2142/87845 Copy

Description

Title

Characterization of Etching Process and Etch Rate of Aluminum Thin Film

Author(s)

Kang, "Ryan" Sungho

Contributor(s)

Gong, Songbin

Issue Date

2014-12

Keyword(s)

• micro-electro-mechanical systems (MEMS)
• RF MEMS
• micro-fabrication etching
• lithography
• physical vapor disposition (PVD)

Type of Resource

other

Language

en

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http://hdl.handle.net/2142/87845

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