Director of Research (if dissertation) or Advisor (if thesis)
Lyding, Joseph W.
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
graphene
etch mask
silicon
nano-fabrication
xenon difluoride
reactive ion etch
Abstract
In this thesis, an alternative future use for graphene will be explored. Graphene, a popular two-dimensional material of remarkable electrical properties, has been thought to be a successor to current day microelectronic materials. With the many challenges posed by the manufacture of conventional devices from graphene, other adaptations for its properties are sought in the work that follows. Chiefly, its mechanical and chemical strength as an etch mask for silicon is tested.We attempt to present the progress toward a working model of a graphene etch mask. The influence of the mask geometry, etch method, etch conditions, substrate quality and other factors will be explored to present a clear understanding of methodology and requirements for carrying out the process. Along the way, other aspects of the project such as the growth and transfer of graphene, which are not the focus but extremely crucial to the results, will be elucidated as required. Possible future directions will also be presented to provide a notion of where the idea can head.
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