X-Ray Diffraction Studies of Palladium-Silicide Thin Films
Coulman, Betty Ann
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Permalink
https://hdl.handle.net/2142/71815
Description
Title
X-Ray Diffraction Studies of Palladium-Silicide Thin Films
Author(s)
Coulman, Betty Ann
Issue Date
1985
Department of Study
Metallurgy and Mining Engineering
Discipline
Metallurgical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Materials Science
Abstract
The growth of Pd(,2)Si thin films from electron beam evaporated Pd films on Si(lll) substrates has been studied using X-ray diffraction techniques. In situ layer growth kinetics were measured over a temperature range of 160-222(DEGREES)C using an X-ray integrated intensity approach. Mosaic structure and impurity levels were analyzed. The film stresses in Pd(,2)Si layers grown at 250(DEGREES)C were determined for initial Pd thicknesses 50-750 (ANGSTROM).
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