Measurement of the Electron Density and the Attachment Rate Coefficient in Silane/helium Discharges
Fleddermann, Charles Byrns
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https://hdl.handle.net/2142/69317
Description
Title
Measurement of the Electron Density and the Attachment Rate Coefficient in Silane/helium Discharges
Author(s)
Fleddermann, Charles Byrns
Issue Date
1985
Department of Study
Electrical Engineering
Discipline
Electrical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Engineering, Electronics and Electrical
Abstract
The electron density in helium and silane/helium glow discharge plasmas was measured in a hollow cathode discharge using microwave diagnostic techniques. When silane is added to the discharge gas, the electron density is drastically reduced, which is attributed to dissociative attachment to a product of the dissociation of the parent silane molecules, either SiH(,2) or SiH(,3). The rate coefficient for the dissociative attachment process was determined to be 2.65 x 10('-10) cm('3)/sec. This indicates that the attachment of electrons by silane fragments is an important kinetic process in silane discharges, and should be considered in models of the glow discharge deposition process.
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