University of Illinois Urbana-Champaign

Magnetic Field Guided Metal-Assisted-Chemical Etching

Lim, Jong Bin

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https://hdl.handle.net/2142/55330

Description

Title
Magnetic Field Guided Metal-Assisted-Chemical Etching
Author(s)
Lim, Jong Bin
Contributor(s)
Li, Xiuling
Issue Date
2014-05
Keyword(s)
  • metal-assisted chemical etching
  • magnetic-guidance
  • photonic crystal
  • membrane reflectors
  • nanoholes
  • electromagnet
Abstract
Metal-assisted chemical etching (MacEtch) is a simple etching method that uses metal as the catalyst for anisotropic etching of semiconductor materials. The purpose of this research is to demonstrate and control the direction of MacEtching by the application of magnetic field (h-MacEtch). Periodic nanohole arrays were made on silicon wafer for high reflectance photonic crystal. A tri-layer of gold, magnetic metal and gold was to catalyze the etching process. A permanent magnet was initially used to determine the sufficient magnitude of magnetic flux density to etch in both vertical and horizontal directions. Then, an electromagnet was simulated and produced in order to achieve the same magnitude of magnetic flux density as that of the permanent magnet. Nickel and Iron were used as magnetic metals, and the etch rate was compared. Thickness of the middle magnetic metal was varied to find the etch rate.
Type of Resource
other
Language
en
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http://hdl.handle.net/2142/55330

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