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https://hdl.handle.net/2142/47605
Description
Title
Maskless Digital Projection Photochemical Etching
Author(s)
Wang, Kaiyuan
Contributor(s)
Goddard, Lynford
Popescu, Gabriel
Issue Date
2013-05
Keyword(s)
photochemical etching
digital projection
maskless projection
semiconductor fabrication
grayscale projection
lithography
Abstract
We demonstrate a maskless photochemical etching method which is capable of performing one-step etching of multi-level and grayscale structures on semiconductor substrates. This method utilizes a digital projector to focus a light pattern onto the sample where the projected image itself is used to define the etching. This method eliminates the need for expensive grayscale masks or laser writing methods. The etch rate is studied by controlling the wavelength and gray-level intensity of the light. Etching feature resolution of 2.5 μm is demonstrated by etching selected portions of the USAF-1951 target. Micropillars, multi-level cubes, and an Archimedean spiral are etched in a single step to illustrate our unique capabilities.
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