Microfabrication of Silicon for Microcavity Plasma Generation in Atmospheric Gas Pressure
Ray, Ipshita
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https://hdl.handle.net/2142/47082
Description
Title
Microfabrication of Silicon for Microcavity Plasma Generation in Atmospheric Gas Pressure
Author(s)
Ray, Ipshita
Contributor(s)
Eden, J.G.
Park, Sung-Jin
Issue Date
2008-05
Keyword(s)
plasma devices
silicon wafer fabrication
microcavity devices
Abstract
Silicon wafers have been used in a variety of devices and with the appropriate kind of fabrication can be used in many applications. My research involved microfabrication of silicon wafers for microcavity plasma devices using a provided recipe. I have fabricated 50 x 50 arrays of inverted pyramidal silicon microcavities in 2 inch diameter Si wafers. The size of the microcavities is 50 μm per square and the apex depth is around 35 μm. These microcavities were created by a series of various deposition and etching processes. Stable operation of devices is determined by the characteristics of multistack dielectric layers such as Silicon Nitride and polyimide. The geometry of metal and Si electrode was very crucial for the microplasma properties and their possible modification in the device will be discussed.
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