University of Illinois Urbana-Champaign

Statistical Temperature Profile with Preserved Dependence on Process Variations

Rogachev, Artem

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https://hdl.handle.net/2142/47007

Description

Title
Statistical Temperature Profile with Preserved Dependence on Process Variations
Author(s)
Rogachev, Artem
Contributor(s)
Chen, Deming
Issue Date
2010-05
Keyword(s)
  • process variations
  • circuit propagation delay
  • device temperature performance
  • transistors
  • circuits
  • device temperature profile calculation
  • statistical static timing analysis
Abstract
Continuous technology scaling has led to increased variation in the physical parameters of any given transistor. This phenomenon, referred to as process variations, causes the propagation delay of a circuit to be a statistical distribution rather than a deterministic value. This distribution can be found by using Statistical Static Timing Analysis (SSTA). Previous works do not account for the effect of temperature on performance, which becomes more significant as transistors get smaller. To attain an accurate estimate of a given circuit’s performance, one must know the temperature profile of the chip. This profile is also statistical, because process variations affect leakage power, which has a direct impact on temperature. In this work we implement an algorithm that calculates the temperature profile in terms of process variations. This profile can be later used to perform temperature aware SSTA.
Type of Resource
text
Language
en
Permalink
http://hdl.handle.net/2142/47007

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