University of Illinois Urbana-Champaign

Electric Field in Aluminum/Aluminum Oxide Microcavity Plasma Devices: Simulating Field on Microdischarge Devices and Its Approximation

Kim, Sung Eun

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https://hdl.handle.net/2142/46529

Description

Title
Electric Field in Aluminum/Aluminum Oxide Microcavity Plasma Devices: Simulating Field on Microdischarge Devices and Its Approximation
Author(s)
Kim, Sung Eun
Contributor(s)
  • S. Park
  • Eden, J. Gary
Issue Date
2011-12
Keyword(s)
  • plasma devices
  • microplasma devices
  • microcavity plasma devices
  • electric field distribution
Abstract
It is the purpose of this research to utilize the Ansoft Maxwell 13 to better visualize the distribution of electric field inside micro plasma device structures and futher approximately derive a certain relationship among parameters related to field. Ability to accurately predict and thus improve the device performance would bring about noticeable changes in micro plasma applications. Electric field intensities influence where the plasma will be formed, and uneven distribution of field would damage device structures. Simulation is done on constant cross-sectioned micro channel device, which maximizes 2-dimensional property of Maxwell 13. Assumptions on electric field distribution were made prior to running a simulation and proved with simulation results. Basic two cases, cavity and channel, were explored while channel device was studied based on: Alternative Current (AC) excitation.
Type of Resource
text
Language
en
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http://hdl.handle.net/2142/46529

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