University of Illinois Urbana-Champaign

Observation of Plasma Propagation in AL/AL2O3 Based Microchannel Devices

Kim, Seung Hyun

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https://hdl.handle.net/2142/46528

Description

Title
Observation of Plasma Propagation in AL/AL2O3 Based Microchannel Devices
Author(s)
Kim, Seung Hyun
Contributor(s)
Eden, J. Gary
Issue Date
2011-12
Keyword(s)
  • plasma devices
  • microplasma devices
  • plasma propagation
  • optical emission profile
  • microchannels
Abstract
Microplasma devices with aluminum/aluminum oxide can be fabricated by electrochemical and micromachining processes. Micro-discharges from those devices have received much attention in recent years both in fundamental research and for industrial applications. In this thesis, microplasma discharge dynamics in an Al/Al2O3 based microchannel device have been examined at atmospheric pressure in Ar. Microplasma is generated in a six channel Al/Al2O3 device having a width of 200-300 μm, a channel length of up to 50 mm, and a volume of 1-15 mm3 on a static gas basis. When micromachining and anodization processes are applied to 125 μm thick aluminum foils, channels have a dielectric barrier structure with the geometry of an embedded electrode. Spatiotemporally resolved optical emission profiles recorded with an ICCD camera and a telescope are presented here. The intensity profiles reveal a speed of plasma as 10-15 km/s and the direction of excited emission along the channels.
Type of Resource
text
Language
en
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http://hdl.handle.net/2142/46528

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