Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing
Liu, Joseph
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Joseph_Liu.pdf
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https://hdl.handle.net/2142/44109
Description
Title
Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing
Author(s)
Liu, Joseph
Issue Date
2013-05-24T21:50:59Z
Director of Research (if dissertation) or Advisor (if thesis)
King, William P.
Department of Study
Mechanical Sci & Engineering
Discipline
Mechanical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Date of Ingest
2013-05-24T21:50:59Z
Keyword(s)
Atomic-force microscope (AFM)
cantilever
nanotopography
Abstract
This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).
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Joseph_Liu.pdf
