Field-Directed Sputter Sharpening for Tailored Probe Materials and Atomic-Scale Lithography
Schmucker, Scott W.; Kumar, Navneet; Abelson, John R.; Daly, Scott R.; Girolami, Gregory S.; Bischof, Maia R.; Jaeger, David L.; Reidy, Rick F.; Gorman, Brian P.; Alexander, Justin; Ballard, Josh B.; Randall, John N.; Lyding, Joseph W.
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https://hdl.handle.net/2142/41285
Description
Title
Field-Directed Sputter Sharpening for Tailored Probe Materials and Atomic-Scale Lithography
Author(s)
Schmucker, Scott W.
Kumar, Navneet
Abelson, John R.
Daly, Scott R.
Girolami, Gregory S.
Bischof, Maia R.
Jaeger, David L.
Reidy, Rick F.
Gorman, Brian P.
Alexander, Justin
Ballard, Josh B.
Randall, John N.
Lyding, Joseph W.
Issue Date
2012-07-03
Keyword(s)
scanning tunneling microscopy
sputtering
Sputter Sharpening, Plasma, Field Emitters
field-directed sputter sharpening
Abstract
Fabrication of ultra-sharp probes is of interest for many applications, including scanned probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultra-sharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. We describe a novel biased-probe field-directed sputter sharpening technique, applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir, and W-HfB2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18 – 26% sharper with atomic-scale lithographic fidelity.
Publisher
Nature Publishing Group
Type of Resource
text
Language
en
Permalink
http://hdl.handle.net/2142/41285
DOI
https://doi.org/10.1038/ncomms1907
Sponsor(s)/Grant Number(s)
Office of Naval Research Grant N00014-06-10120
Defense Advanced Research Project Agency and Space and Naval Warfare Center, San Diego contract N66001-08-C-2040
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