Confinement of microplasma in silicon trenches with widths as small as 2.5 μm
Kim, Eung Soo
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https://hdl.handle.net/2142/34514
Description
Title
Confinement of microplasma in silicon trenches with widths as small as 2.5 μm
Author(s)
Kim, Eung Soo
Issue Date
2012-09-18T21:23:30Z
Director of Research (if dissertation) or Advisor (if thesis)
Eden, James G.
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
microplasma
nanoplasma
Paschen's curve
pd curve
Abstract
In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.
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