Sharpening of conductive nanoprobes for scanning tunneling microscopy by field-directed sputter sharpening

Schmucker, Scott W.

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https://hdl.handle.net/2142/30793 Copy

Description

Title

Sharpening of conductive nanoprobes for scanning tunneling microscopy by field-directed sputter sharpening

Author(s)

Schmucker, Scott W.

Issue Date

2009-05

Director of Research (if dissertation) or Advisor (if thesis)

Lyding, Joseph W.

Department of Study

Electrical and Computer Engineering

Discipline

Electrical and Computer Engineering

Degree Granting Institution

University of Illinois at Urbana-Champaign

Degree Name

M.S.

Degree Level

Thesis

Date of Ingest

2012-05-02T19:50:39Z

Keyword(s)

• scanning tunneling microscopy (STM)
• sputter sharpening
• field-directed sputter sharpening

Language

en

Abstract

This thesis presents a novel sputter erosion sharpening technique for the production of conductive probes on nanometer and atomic scales. This field-directed sputter sharpening procedure is shown to reliably sharpen both tungsten and platinum-iridium alloy probes and to produce atomic-scale topological changes, distinct from traditional sputter erosion sharpening. Possible justification for this effect is presented in the form of controlled ion current modulation at the probe apex. Furthermore, the probes are found to facilitate high-fidelity patterning of the hydrogen passivated silicon surface.

Type of Resource

text

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http://hdl.handle.net/2142/30793

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