University of Illinois Urbana-Champaign

Sharpening of conductive nanoprobes for scanning tunneling microscopy by field-directed sputter sharpening

Schmucker, Scott W.

Content Files
SWS-M.S.+Thesis+May+2009.pdf

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https://hdl.handle.net/2142/30793

Description

Title
Sharpening of conductive nanoprobes for scanning tunneling microscopy by field-directed sputter sharpening
Author(s)
Schmucker, Scott W.
Issue Date
2009-05
Director of Research (if dissertation) or Advisor (if thesis)
Lyding, Joseph W.
Department of Study
Electrical and Computer Engineering
Discipline
Electrical and Computer Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Date of Ingest
2012-05-02T19:50:39Z
Keyword(s)
  • scanning tunneling microscopy (STM)
  • sputter sharpening
  • field-directed sputter sharpening
Language
en
Abstract
This thesis presents a novel sputter erosion sharpening technique for the production of conductive probes on nanometer and atomic scales. This field-directed sputter sharpening procedure is shown to reliably sharpen both tungsten and platinum-iridium alloy probes and to produce atomic-scale topological changes, distinct from traditional sputter erosion sharpening. Possible justification for this effect is presented in the form of controlled ion current modulation at the probe apex. Furthermore, the probes are found to facilitate high-fidelity patterning of the hydrogen passivated silicon surface.
Type of Resource
text
Permalink
http://hdl.handle.net/2142/30793

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