A Microarchitectural Model of Process Variation for Near-threshold Computing

Karpuzcu, Ulya R; Kolluru, Krishna; Kim, Nam Sung; Torrellas, Josep

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https://hdl.handle.net/2142/28573 Copy

Description

Title

A Microarchitectural Model of Process Variation for Near-threshold Computing

Author(s)

• Karpuzcu, Ulya R
• Kolluru, Krishna
• Kim, Nam Sung
• Torrellas, Josep

Issue Date

2011-11-29

Keyword(s)

Near-threshold computing, process variation

Abstract

Near-Threshold Voltage Computing (NTC), where the supply voltage is only slightly higher than the transistors’ threshold voltage, is a promising approach to push back the many-core power wall. A key NTC shortcoming is the higher sensitivity to parameter (process, supply voltage, temperature) variation. This report introduces a microarchitectural model to characterize increased sensitivity to process variation at near-thresold voltages.

Type of Resource

text

Language

en

Permalink

http://hdl.handle.net/2142/28573

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