Channeling studies of the location of zinc in GaAs
Christenson, Kurt Karl
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https://hdl.handle.net/2142/23931
Description
Title
Channeling studies of the location of zinc in GaAs
Author(s)
Christenson, Kurt Karl
Issue Date
1989
Doctoral Committee Chair(s)
Eades, J.A.
Department of Study
Physics
Discipline
Physics
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Diffusion of Zinc in Gallium Arsenide (GaAs)
Diffusion Coefficient
Fick's Law
Zinc Doping
Channeling Studies
Language
en
Abstract
The diffusion of zinc in GaAs is highly anomalous in that the diffusion coefficient
(D) is proportional to the zinc concentration squared in marked contrast to Fick's law
which predicts that D is concentration independent. D is also very sensitive to the ambient
conditions during diffusion, particularly the arsenic overpressure and the presence of other
doping species. Further, heavy zinc doping can increase the self diffusion rates for
gallium and aluminum by 105 and is thus useful for selectively ,disordering GaAs/GaAlAs
layer structures. The diffusion mechanisms involved are poorly understood, particularly
the experimental finding that the column V sites (As, P and Sb) are not disordered.
We believe that the anomalous nature can be explained by combining the theories
of R. L. Longini (1962) on the effect of the hole density on the interstitial population and
of K. Weiser (1962) on the effect of the charge state of an interstitial on the diffusion
activation energy. To test our hypothesis, we have located the position of the zinc in the
GaAs lattice with the ALCHEMI technique (Atom Location by CHanneling Enhanced
Microanalysis) in a Transmission Electron Microscope (TEM). This required substantial
enhancements to the x-ray microanalytic abilities of the TEM along with an improved
understand of the nature of the illumination in the immersion lens of a TEM, all of which
are discussed.
Our results indicate that, within the experimental error, all of the zinc occupies the
gallium sites which is consistent with our hypothesis. Further research involving TEM,
synchrotron, diffusion and device studies are also suggested.
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