A hybrid hydrodynamic-Monte Carlo simulation of the transport of neutral radicals in low-pressure remote plasma sources
Hartig, Michael Joseph
This item is only available for download by members of the University of Illinois community. Students, faculty, and staff at the U of I may log in with your NetID and password to view the item. If you are trying to access an Illinois-restricted dissertation or thesis, you can request a copy through your library's Inter-Library Loan office or purchase a copy directly from ProQuest.
Permalink
https://hdl.handle.net/2142/20459
Description
Title
A hybrid hydrodynamic-Monte Carlo simulation of the transport of neutral radicals in low-pressure remote plasma sources
Author(s)
Hartig, Michael Joseph
Issue Date
1993
Doctoral Committee Chair(s)
Kushner, Mark J.
Department of Study
Electrical and Computer Engineering
Discipline
Electrical Engineering
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
Ph.D.
Degree Level
Dissertation
Keyword(s)
Physics, Fluid and Plasma
Language
eng
Abstract
In low pressure electron cyclotron resonance and remote plasma enhanced chemical vapor deposition reactors (milliTorr to hundreds of milliTorr) the mean free path of excited state neutrals can be commensurate with the vessel dimensions. Deposition species may collide with the wall several times before encountering the substrate. While the movement of these particles is essentially ballistic, the advective flow of the background gas is a significant factor in the determination of the transport of the neutral radicals. To address these conditions, a hybrid hydrodynamic-Monte Carlo model has been developed. The advective flow field is calculated from the mass and momentum equations. Radical transport is then simulated using Monte Carlo techniques that include inelastic collisions with the background species and other MC particles, absorbing or reflective collisions with reactor surfaces, or momentum transfer with the advective fluid.
Presented here are the results describing the effects of geometry, pressure and gas flow for gas mixtures containing SiH$\sb4$. Identity, uniformity, and angle of incidence of the radical flux to the substrate will be addressed with the goal of optimizing the fluxes of selected species.
Use this login method if you
don't
have an
@illinois.edu
email address.
(Oops, I do have one)
IDEALS migrated to a new platform on June 23, 2022. If you created
your account prior to this date, you will have to reset your password
using the forgot-password link below.