Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

Stromberg, Lauren L.

Permalink

https://hdl.handle.net/2142/16004 Copy

Description

Title

Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

Author(s)

Stromberg, Lauren L.

Issue Date

2010-05-18T18:55:53Z

Director of Research (if dissertation) or Advisor (if thesis)

Paulino, Glaucio H.

Department of Study

Civil & Environmental Eng

Discipline

Civil Engineering

Degree Granting Institution

University of Illinois at Urbana-Champaign

Degree Name

M.S.

Degree Level

Thesis

Keyword(s)

• topology optmization
• pattern gradation
• material layout
• high-rise buildings
• pattern constraints

Abstract

This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.

Graduation Semester

2010-5

Permalink

http://hdl.handle.net/2142/16004

Copyright and License Information

Copyright 2010 by Lauren Lynne Stromberg. All rights reserved.

Owning Collections