Growth and characterization of III-V compound semiconductor nanostructures by metalorganic chemical vapor deposition
Dowdy, Ryan S.
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https://hdl.handle.net/2142/14672
Description
Title
Growth and characterization of III-V compound semiconductor nanostructures by metalorganic chemical vapor deposition
Author(s)
Dowdy, Ryan S.
Issue Date
2010-01-06T16:20:58Z
Director of Research (if dissertation) or Advisor (if thesis)
Li, Xiuling
Doctoral Committee Chair(s)
Li, Xiuling
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
nanowire
Vapor-liquid-solid (VLS)
III-V
quantum dot
gaas
offcut
suspended
zinc
Indium Arsenide (InAs)
nanostructure
movpe
mocvd
Abstract
Planar <110> GaAs nanowires and quantum dots grown by atmospheric MOCVD have
been introduced to non-standard growth conditions such as incorporating Zn and growing them
on free-standing suspended films and on 10° off-cut substrates. Zn doped nanowires exhibited
periodic notching along the axis of the wire that is dependent on Zn/Ga gas phase molar ratios.
Planar nanowires grown on suspended thin films give insight into the mobility of the seed
particle and change in growth direction. Nanowires that were grown on the off-cut sample
exhibit anti-parallel growth direction changes. Quantum dots are grown on suspended thin films
and show preferential growth at certain temperatures. Envisioned nanowire applications include
twin-plane superlattices, axial pn-junctions, nanowire lasers, and the modulation of nanowire
growth direction against an impeding barrier and varying substrate conditions.
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