Automating microscopic image analysis post-photolithography with machine learning

Fulfagar, Hardik Sandeep

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https://hdl.handle.net/2142/124402 Copy

Description

Title

Automating microscopic image analysis post-photolithography with machine learning

Author(s)

Fulfagar, Hardik Sandeep

Issue Date

2024-04-29

Director of Research (if dissertation) or Advisor (if thesis)

Nahrstedt, Klara

Department of Study

Computer Science

Discipline

Computer Science

Degree Granting Institution

University of Illinois at Urbana-Champaign

Degree Name

M.S.

Degree Level

Thesis

Keyword(s)

• Machine Learning
• Computer Vision
• Semiconductor Photolithography
• Microscopic Image Analysis Automation
• Dataset Creation
• Image Classification
• Semiconductor Defect Detection

Abstract

This thesis addresses the challenges in the manual analysis of semiconductor images by leveraging machine learning techniques to automate the process, with a focus on the photolithography stage. We compare various machine learning techniques for classifying images based on exposure and development levels, aimed at overcoming the limitations of human error in traditional analysis methods. In this thesis, we have created a dataset and used a comprehensive framework for the application of machine learning models. By shifting the focus from merely detecting surface defects to understanding the underlying causes during the photolithography process, this research aims to provide more targeted solutions for improving semiconductor manufacturing and understanding the errors. The findings of this thesis have the potential to enhance methodological precision and efficiency in semiconductor research, particularly beneficial in academic settings for instant analysis and feedback, thereby improving the learning experience for students studying this critical phase of semiconductor manufacturing.

Graduation Semester

2024-05

Type of Resource

Thesis

Copyright and License Information

Copyright 2024 Hardik Sandeep Fulfagar

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