Studies of Various Aspects of Semiconductor Processing: Thermal Etching, Surface Diffusion, Kinetic Analysis of Rapic Thermal Processing

Ditchfield, Roderick

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https://hdl.handle.net/2142/121637 Copy

Description

Title

Studies of Various Aspects of Semiconductor Processing: Thermal Etching, Surface Diffusion, Kinetic Analysis of Rapic Thermal Processing

Author(s)

Ditchfield, Roderick

Issue Date

1993

Director of Research (if dissertation) or Advisor (if thesis)

Seebauer, Edmund G.

Department of Study

Chemical & Biomolecular Engineering

Discipline

Chemical Engineering

Degree Granting Institution

University of Illinois at Urbana-Champaign

Degree Name

M.S. (master's)

Degree Level

Thesis

Keyword(s)

• Surface Science
• Semiconductor

Language

eng

Type of Resource

text

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