Subsurface two-photon lithography: improvements and applications
Littlefield, Alexander James
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https://hdl.handle.net/2142/117886
Description
Title
Subsurface two-photon lithography: improvements and applications
Author(s)
Littlefield, Alexander James
Issue Date
2021-12-09
Director of Research (if dissertation) or Advisor (if thesis)
Goddard, Lynford L.
Braun, Paul V.
Department of Study
Electrical & Computer Eng
Discipline
Electrical & Computer Engr
Degree Granting Institution
University of Illinois at Urbana-Champaign
Degree Name
M.S.
Degree Level
Thesis
Keyword(s)
two-photon lithography
direct laser writing
gradient index
mathematical methods
waveguide coupling
Language
en
Abstract
Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the writing medium, allowing different densities of photoresist to be created within. Thus, with SCRIBE, a variety of gradient index (GRIN) optical devices can be fabricated. In this work, we explore the challenges with applying SCRIBE-written optics as tools in standard planar photolithography. We propose and explore several solutions to these challenges via new calibration and correction procedures. Furthermore, we demonstrate the advantages of our new calibration procedure on practical devices, including diffraction gratings. Finally, we share improvements on SCRIBE-written waveguide insertion loss and preliminary data on possible applications. Overall, we detail both improvements to the fundamental process of SCRIBE and a variety of applications that are uniquely well-suited to SCRIBE.
Has Part
Errata for “Subsurface two-photon lithography: Improvements and applications” by Alexander James Littlefield https://hdl.handle.net/2142/120072
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