Nanocrystalline diamonds have become attractive for advancing many existing technologies and materials, owed to their superb mechanical, thermal, and optical properties, among others. Yet, current methods utilized in diamond growth must be improved to provide high quality growth of particles and films at low costs and improved scalability. Presented here is the flame vapor deposition (FVD) of nanodiamond particles and films in methane-hydrogen-air flat flames at atmospheric pressure. Due to the synthesis at atmospheric pressure and the larger area of the burner, diamond growth can be scaled up at lower costs and in a more time efficient manner. This method also allows for the growth of nanocrystalline diamond to be more finely controlled by tuning parameters such as the gas flow rates, substrate material, and seeding density. Moreover, the addition of an external electric bias is shown to be influential in controlling the porosity and thickness of the NCD films. Notably, this method also provides new growth conditions beyond the previously considered diamond-growth region of the C-H-O phase diagram. Overall, with the low cost and simple for operation, the atmospheric-pressure FVD approach will offer opportunities to facilitate the scaling-up of NCD synthesis.
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