Impurity-induced disordering (IID) of vertical-cavity surface-emitting lasers
(VCSELs) as a platform technology enables mode engineering through the
precise introduction of mirror loss while simultaneously improving top distributed Bragg reflector (DBR) conductivity. Strain-engineering of the diffusion masks used in IID processing impacts characteristics of the aspect
ratio of the disordering diffusant and enables high-power single-mode emission. The modulation response and applicability of this platform to the goal
of polarization control in 850 nm gallium arsenide-based oxide-confined VCSELs are investigated. An analysis of the high-frequency damping factors of
IID VCSELs given varying disordering depths is provided. The experimental
design and fabrication process for polarization controlled VCSELs using elliptical strain-engineered disorder-defined apertures is discussed, and measured
polarization characteristics are analyzed as a function of strained diffusion
mask ellipticity. The orthogonal polarization suppression ratios (OPSRs)
of VCSELs using circular disorder-defined apertures under strain-engineered
diffusion mask variants are discussed.
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