Velocity map imaging of teos and deposition analysis of febid process in teos

Pintea, Maria

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https://hdl.handle.net/2142/107517 Copy

Description

Title

Velocity map imaging of teos and deposition analysis of febid process in teos

Author(s)

Pintea, Maria

Contributor(s)

• Mason, Nigel
• Hermanns, Felix

Issue Date

2020-06-25

Keyword(s)

Dynamics and kinetics

Abstract

Called “the miracle material”(D.N. Payne, SPIE 2020), silica is the one of the new generation of materials used for optical fiber, as nanoparticles for medical purposes in cancer treatment and for mask repair and production, “the holy grail” of the electronics industry. We have used Si(OEt)$_{4}$ or TEOS to deposit silica structure on a surface using the method of Focused Electron Beam Induced Deposition (FEBID), whilst also undertaking a thorough analysis of TEOS electron induced fragmentation using velocity map imaging. Experiments are combined with theoretical calculations of electron interactions with TEOS and models of the FEBID process. The electron beam energy range we used was 0 - 25eV. The present research is part of an ITN wider research project, ELENA (www.elena.hi.is) exploring the dynamics of FEBID and Extreme Ultraviolet Lithography and their development as a methodology for building nanostructures. ELENA is an Initial Training Network funded by the European Union Horizon 2020 program Grant number 722149.

Publisher

International Symposium on Molecular Spectroscopy

Type of Resource

Text

Language

eng

Permalink

http://hdl.handle.net/2142/107517

Copyright and License Information

Copyright 2020 is held by the Author(s)

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