University of Illinois Urbana-Champaign

Properties of Silicon Implanted with Arsenic through Silicon Dioxide

Myers, David Richard

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https://hdl.handle.net/2142/75613

Description

Title
Properties of Silicon Implanted with Arsenic through Silicon Dioxide
Author(s)
Myers, David Richard
Issue Date
1977-01
Keyword(s)
  • Ion implantation
  • Arsenic in silicon
  • Damage
  • Recoil implantation
Publisher
Coordinated Science Laboratory, University of Illinois at Urbana-Champaign
Series/Report Name or Number
Coordinated Science Laboratory Report no. UILU-ENG 77-2203, R-756
Type of Resource
text
Language
English
Permalink
http://hdl.handle.net/2142/75613
Sponsor(s)/Grant Number(s)
  • Joint Services Electronics Program / DAAB-07-72-C-0259
  • National Science Foundation / NSF DMR 73-02359

Owning Collections

Report - Coordinated Science Laboratory PRIMARY